Senior Lithography Application Engineer
尼斯菲尔德仪器 (NFI) 是一个快速增长的规模化高科技公司。我们设计，开发，集成，市场和服务先进的计量机械。我们的机器使客户 - 世界领先的芯片制造商能够通过扫描探测器显微镜系统提高生产收益率，从而增加他们的芯片功能，这反过来导致更小，更强大的消费电子产品。我们成立于2016年，将科学技术领域最有创意的人类 （约320名员工）聚集在一起，并开发出一种独特的革命性高水平。李图学和光学成像高级应用工程师，具有强大的背景在立图学，EUV 和扫描仪性能优化。在这个角色中，你将利用你的光学成形和立图物理学方面的专业知识来推进我们的计量学和过程控制解决方案。你将做什么？·开发并优化用于先进的计量学与检查中的光学成影模型和技术。· 将扫描器性能知识 （CDU,焦点，叠加，异差，成像限制）转换为创新的过程控制解决方法。· 应用 （高 NA）EUV 面具特征化专业知识，包括3D 功能计量学 （吸收器 CD,侧墙角，高度）,并对 EUV 和带外光照曝光的行为进行抵抗。· 先进方法如散射仪和计算成像以推广线上过程控制的限制。· 与系统架构师，AFM/成像专家和软件工程师合作，将成像创新集成了我们的商业系统。·与全球领先的半导体工厂合作，验证和部署解决方案在大批量制造环境中。我们需要什么？· 物理学，光学工程，电气工程或相关领域的博士学位或士学位。· 具有光学成像，欧元仪图形技术和扫描器性能优化方面的深入专业知识。· 在欧元罩，散射测量和抗性特征领域的经验证明。· 与计量学和过程控制应用程序结合了石版知识的能力。· 5年以上工业或半导体石版，光学计量学或相关领域的先进学术研究经验。· 有强大的分析和解决问题的技能，能够在快速发展的研发环境中跨界工作。原创发表于喜马拉雅山
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Nearfield Instruments (NFI) is a fast-growing scale-up high-tech company. We design, develop, integrate, market and service advanced metrology machines. Our machines enable our customers - the world’s leading chipmakers – to increase the production yields, and thus, functionality of their microchips, which in turn leads to smaller, more powerful consumer electronics.
Founded in 2016, we bring together the most creative minds (approx. 320 employees) in science and technology and develop a one-of-a-kind, revolutionary high throughput Scanning Probe Microscopy system.
About the job
Senior application engineer in Lithography and Optical Imaging with a strong background in lithography, EUV, and scanner performance optimization. In this role, you will leverage your expertise in optical imaging and lithography physics to advance our metrology and process control solutions.
What will you be doing?
- Develop and optimize optical imaging models and techniques for use in advanced metrology and inspection.
- Translate scanner performance knowledge (CDU, focus, overlay, aberrations, imaging limits) into innovative process control solutions.
- Apply expertise in (High-NA) EUV mask characterization, including 3D feature metrology (absorber CD, sidewall angle, height) and resist behavior under EUV and out-of-band light exposure.
- Advance methods such as scatterometry and computational imaging to push the limits of in-line process control.
- Collaborate with system architects, AFM/imaging experts, and software engineers to integrate imaging innovations into our commercial systems.
- Work with leading global semiconductor fabs to validate and deploy solutions in high-volume manufacturing environments.
What do we require from you?
- PhD or MSc in Physics, Optical Engineering, Electrical Engineering, or related field.
- Deep expertise in optical imaging, EUV lithography, and scanner performance optimization.
- Proven experience in EUV mask, scatterometry, and resist characterization.
- Ability to bridge lithography knowledge with metrology and process control applications.
- 5+ years of industry or advanced academic research experience in semiconductor lithography, optical metrology, or related domains.
- Strong analytical and problem-solving skills, with the ability to work across disciplines in a fast-paced R&D environment.
Originally posted on Himalayas